DocumentCode
3536116
Title
Sub-micro size spin-valve transistor
Author
Huang, Y.W. ; Lo, C.K. ; Yao, Y.D. ; Huang, D.R. ; Huang, J.H.
Author_Institution
Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2005
fDate
4-8 April 2005
Firstpage
1205
Lastpage
1206
Abstract
In this work, the microstructure of the SVT by a lift-off process using E-beam lithography is defined. This will contribute to the research of the micro size spin transistor. SEM was used to image the structure of the SVT. The structure of the pseudo spin-valve (PSV) with a MR of 3% is Py (3 nm)/Co (1 nm)/Cu (5 nm)/Co (3 nm), where Py stands for Ni80Fe20. All corresponding films are thermally deposited by e-gun evaporation on a Si(100) substrate which is prefabricated a p-n junction. The p-n junction is fabricated by a standard CVD technique. The collector current (Ic) and magnetocurrent (MC) versus applied magnetic field in the common collector circuitry at room temperature operation is measured. The SVT gives the collector current of 147.8 μA at magnetically parallel state and 119.4 μA at magnetically anti-parallel state. The corresponding MC is roughly 24 %, The MC is defined by (IC,P - IC,AP)/IC,AP, and the subscripts of P and AP denote the parallel and anti-parallel magnetic configuration in the pseudo spin-valve. The emitter current is 20.5 mA and the transfer ratio (IB/IC) is 7.2 E-3.
Keywords
Permalloy; chemical vapour deposition; cobalt; copper; electron beam lithography; elemental semiconductors; magnetic multilayers; magnetic thin film devices; magnetic thin films; magnetoresistance; p-n junctions; scanning electron microscopy; silicon; spin valves; transistors; vacuum deposited coatings; vacuum deposition; 1 nm; 119.4 muA; 147.8 muA; 20.5 mA; 3 nm; 5 nm; CVD technique; E-beam lithography; Ni80Fe20-Co-Cu-Co; SEM; Si; Si(100) substrate; collector current; common collector circuitry; e-gun evaporation; emitter current; lift-off process; magnetic configuration; magnetically anti-parallel state; magnetically parallel state; magnetocurrent; magnetoresistance; microstructure; p-n junction; pseudo spin-valve; submicro size spin-valve transistor; transfer ratio; Lithography; Magnetic materials; Magnetic tunneling; Magnetoelectronics; Materials science and technology; P-n junctions; Physics; Schottky barriers; Temperature; Vacuum technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1464032
Filename
1464032
Link To Document