• DocumentCode
    3536116
  • Title

    Sub-micro size spin-valve transistor

  • Author

    Huang, Y.W. ; Lo, C.K. ; Yao, Y.D. ; Huang, D.R. ; Huang, J.H.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2005
  • fDate
    4-8 April 2005
  • Firstpage
    1205
  • Lastpage
    1206
  • Abstract
    In this work, the microstructure of the SVT by a lift-off process using E-beam lithography is defined. This will contribute to the research of the micro size spin transistor. SEM was used to image the structure of the SVT. The structure of the pseudo spin-valve (PSV) with a MR of 3% is Py (3 nm)/Co (1 nm)/Cu (5 nm)/Co (3 nm), where Py stands for Ni80Fe20. All corresponding films are thermally deposited by e-gun evaporation on a Si(100) substrate which is prefabricated a p-n junction. The p-n junction is fabricated by a standard CVD technique. The collector current (Ic) and magnetocurrent (MC) versus applied magnetic field in the common collector circuitry at room temperature operation is measured. The SVT gives the collector current of 147.8 μA at magnetically parallel state and 119.4 μA at magnetically anti-parallel state. The corresponding MC is roughly 24 %, The MC is defined by (IC,P - IC,AP)/IC,AP, and the subscripts of P and AP denote the parallel and anti-parallel magnetic configuration in the pseudo spin-valve. The emitter current is 20.5 mA and the transfer ratio (IB/IC) is 7.2 E-3.
  • Keywords
    Permalloy; chemical vapour deposition; cobalt; copper; electron beam lithography; elemental semiconductors; magnetic multilayers; magnetic thin film devices; magnetic thin films; magnetoresistance; p-n junctions; scanning electron microscopy; silicon; spin valves; transistors; vacuum deposited coatings; vacuum deposition; 1 nm; 119.4 muA; 147.8 muA; 20.5 mA; 3 nm; 5 nm; CVD technique; E-beam lithography; Ni80Fe20-Co-Cu-Co; SEM; Si; Si(100) substrate; collector current; common collector circuitry; e-gun evaporation; emitter current; lift-off process; magnetic configuration; magnetically anti-parallel state; magnetically parallel state; magnetocurrent; magnetoresistance; microstructure; p-n junction; pseudo spin-valve; submicro size spin-valve transistor; transfer ratio; Lithography; Magnetic materials; Magnetic tunneling; Magnetoelectronics; Materials science and technology; P-n junctions; Physics; Schottky barriers; Temperature; Vacuum technology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
  • Print_ISBN
    0-7803-9009-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2005.1464032
  • Filename
    1464032