Title :
Directions for technology CAD
Author_Institution :
Intel Corp., Santa Clara, CA, USA
Abstract :
Major changes have occurred in the technology CAD field in recent years-trends that promise to significantly increase roles for TCAD tools. Emerging trends in statistical design, interconnect engineering, and automated technology optimization are analyzed, together with their implications on TCAD modeling
Keywords :
circuit CAD; circuit optimisation; integrated circuit design; integrated circuit interconnections; semiconductor process modelling; statistical process control; TCAD modeling; TCAD tools; automated technology optimization; chip interconnect optimization; emerging trends; interconnect engineering; statistical IC design; statistical design; statistical process control; technology CAD; Circuit simulation; Delay; Design automation; Design optimization; Integrated circuit interconnections; Integrated circuit modeling; Integrated circuit technology; Manufacturing processes; Numerical models; Process control;
Conference_Titel :
Microelectronics and VLSI, 1995. TENCON '95., IEEE Region 10 International Conference on
Print_ISBN :
0-7803-2624-5
DOI :
10.1109/TENCON.1995.496373
