DocumentCode
3536325
Title
Directions for technology CAD
Author
Mar, Jerry
Author_Institution
Intel Corp., Santa Clara, CA, USA
fYear
1995
fDate
6-10 Nov 1995
Firstpage
202
Lastpage
203
Abstract
Major changes have occurred in the technology CAD field in recent years-trends that promise to significantly increase roles for TCAD tools. Emerging trends in statistical design, interconnect engineering, and automated technology optimization are analyzed, together with their implications on TCAD modeling
Keywords
circuit CAD; circuit optimisation; integrated circuit design; integrated circuit interconnections; semiconductor process modelling; statistical process control; TCAD modeling; TCAD tools; automated technology optimization; chip interconnect optimization; emerging trends; interconnect engineering; statistical IC design; statistical design; statistical process control; technology CAD; Circuit simulation; Delay; Design automation; Design optimization; Integrated circuit interconnections; Integrated circuit modeling; Integrated circuit technology; Manufacturing processes; Numerical models; Process control;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics and VLSI, 1995. TENCON '95., IEEE Region 10 International Conference on
Print_ISBN
0-7803-2624-5
Type
conf
DOI
10.1109/TENCON.1995.496373
Filename
496373
Link To Document