• DocumentCode
    3536545
  • Title

    Fabrication of L10-FePt thin films by rapid thermal annealing

  • Author

    Aimuta, K. ; Nishimura, K. ; Hashi, S. ; Inoue, M.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan
  • fYear
    2005
  • fDate
    4-8 April 2005
  • Firstpage
    1279
  • Lastpage
    1280
  • Abstract
    The indirect rapid thermal annealing system with water cooling for the fabrication of L10-FePt thin films at low temperature was effectively developed. The FePt thin films were deposited on corning #7059 substrates by RF magnetron sputtering, and film composition was determined by energy disperse spectroscopy. The magnetic properties (measured by a vibrating sample magnetometer), crystalline structure (determined by X-ray diffraction) and film morphology and roughness (observed by an atomic force microscope) during the ordering process were consequently investigated. Results show that the FePt thin films changed to L10 ordered structure at lower glass substrate temperature by using indirect rapid thermal annealing system. Moreover, the grain diameter calculated by Scherrer´s equation from FePt(111) peaks was smaller than conventional thermal annealing.
  • Keywords
    X-ray diffraction; atomic force microscopy; cooling; crystal structure; grain size; iron alloys; materials preparation; metallic thin films; order-disorder transformations; platinum alloys; rapid thermal annealing; sputtered coatings; surface composition; surface morphology; surface roughness; FePt; L10 ordered structure; L10-FePt thin film fabrication; RF magnetron sputtering; Scherrer equation; X-ray diffraction; atomic force microscope; corning #7059 glass substrates; crystalline structure; energy disperse spectroscopy; film composition; film morphology; film roughness; grain diameter; magnetic properties; ordering process; rapid thermal annealing; vibrating sample magnetometer; water cooling; Atomic force microscopy; Atomic measurements; Fabrication; Force measurement; Magnetic films; Rapid thermal annealing; Rapid thermal processing; Sputtering; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
  • Print_ISBN
    0-7803-9009-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2005.1464069
  • Filename
    1464069