DocumentCode :
3537972
Title :
Study on micro-fabrication processes in CoFeB/MgO/CoFeB magnetic tunnel junctions
Author :
Maehara, H. ; Osada, Takenori ; Doi, M. ; Sakamoto, K. ; Tsunekawa, K. ; Djayaprawira, D.D. ; Kodaira, Y. ; Watanabe, N. ; Kubota, H. ; Fukushima, A. ; Otani, Y. ; Yuasa, S. ; Ando, K.
Author_Institution :
Anelva Corp., Tokyo, Japan
fYear :
2005
fDate :
4-8 April 2005
Firstpage :
1535
Lastpage :
1536
Abstract :
The effect of reactive ion etching (RIE) micro-fabrication process using methanol (CH3OH) gas on the magnetoresistance properties of CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) was investigated in this paper. The result has been compared with that of the MTJs etched with ion-milling method.
Keywords :
boron alloys; cobalt alloys; iron alloys; magnesium compounds; sputter etching; tunnelling magnetoresistance; Ta-CuN-Ta-Pt50Mn50-Co70Fe30-Ru-Co60Fe20B20-MgOCo60Fe20B20-Ta-Ru; ion milling; magnetic tunnel junctions; magnetoresistance; methanol gas; microfabrication; reactive ion etching; Lithography; Magnetic fields; Magnetic properties; Magnetic tunneling; Methanol; Plasma applications; Plasma density; Plasma sources; Sputter etching; Tunneling magnetoresistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
Type :
conf
DOI :
10.1109/INTMAG.2005.1464200
Filename :
1464200
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3537972
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