Title :
Increased magnetic damping of permalloy upon Cr implantation
Author :
Fassbender, J. ; McCord, J. ; Weisheit, M. ; Mattheis, R.
Author_Institution :
Inst. fur Ionenstrahlphys. & Materialforschung, Dresden, Germany
Abstract :
The static and dynamic magnetic properties of 20 nm thick permalloy films are studied as prepared and after Cr implantation with different Cr fluences. Doping results a decrease in the Curie temperature of the permalloy film with the implantation fluence. The magnetization damping is investigated by performing pulsed inductive microwave magnetometry (PIMM) for various applied magnetic fields. It is found that upon Cr implantation the PIMM amplitude decreases consistent with a decrease in the uniaxial anisotropy and a reduction in saturation magnetization. In contrast to this, a 7-fold increase of the magnetic damping is obtained for only 4% of the Cr doping.
Keywords :
Curie temperature; Permalloy; doping profiles; ferromagnetic materials; ferromagnetic relaxation; magnetic anisotropy; magnetic thin films; metallic thin films; spin dynamics; 20 nm; Curie temperature; Ni80Fe20:Cr; doping; implantation fluence; magnetic damping; magnetic properties; permalloy films; pulsed inductive microwave magnetometry; saturation magnetization; uniaxial anisotropy; Chromium; Damping; Doping; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Saturation magnetization; Temperature;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1464244