Increased magnetic damping of permalloy upon Cr implantation

Author

Fassbender, J. ; McCord, J. ; Weisheit, M. ; Mattheis, R.

Author_Institution

Inst. fur Ionenstrahlphys. & Materialforschung, Dresden, Germany

fYear

2005

fDate

4-8 April 2005

Firstpage

1621

Lastpage

1622

Abstract

The static and dynamic magnetic properties of 20 nm thick permalloy films are studied as prepared and after Cr implantation with different Cr fluences. Doping results a decrease in the Curie temperature of the permalloy film with the implantation fluence. The magnetization damping is investigated by performing pulsed inductive microwave magnetometry (PIMM) for various applied magnetic fields. It is found that upon Cr implantation the PIMM amplitude decreases consistent with a decrease in the uniaxial anisotropy and a reduction in saturation magnetization. In contrast to this, a 7-fold increase of the magnetic damping is obtained for only 4% of the Cr doping.

Keywords

Curie temperature; Permalloy; doping profiles; ferromagnetic materials; ferromagnetic relaxation; magnetic anisotropy; magnetic thin films; metallic thin films; spin dynamics; 20 nm; Curie temperature; Ni₈₀Fe₂₀:Cr; doping; implantation fluence; magnetic damping; magnetic properties; permalloy films; pulsed inductive microwave magnetometry; saturation magnetization; uniaxial anisotropy; Chromium; Damping; Doping; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Saturation magnetization; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1464244

Filename

1464244