DocumentCode :
3539072
Title :
Modifying interlayer coupling in CoFe/Bi/Co trilayer junction by post-annealing treatments
Author :
Hsu, Jen-Hwa ; Sahu, Deepak ; Xue, Zhi-Long ; Sun, A.C. ; Chen, Cheng-Hsuan
Author_Institution :
Dept. of Phys., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2005
fDate :
4-8 April 2005
Firstpage :
1757
Lastpage :
1758
Abstract :
Trilayer structures CoFe/Bi/Co were prepared by dc sputtering at room temperature. The samples were then annealed at temperatures from 50°C to 250°C for 30 minutes. The crystalline structure, microstructures and magnetization loops of the as-deposited and annealed samples were investigated by X-ray diffraction, transmission electron microscopy (TEM) and vibrating sample magnetometer respectively. The correlation of interface parameters with interlayer coupling was analyzed and presented as function of the different annealing temperatures.
Keywords :
X-ray diffraction; annealing; bismuth; cobalt; cobalt alloys; crystal microstructure; crystal structure; ferromagnetic materials; interface roughness; iron alloys; magnetic multilayers; magnetisation; sputter deposition; transmission electron microscopy; 20 to 25 degC; 30 min; 50 to 250 degC; CoFe-Bi-Co; X-ray diffraction; annealing temperatures; crystalline structure; dc sputtering; interface parameters; interlayer coupling; magnetization loops; microstructures; postannealing treatments; room temperature; transmission electron microscopy; trilayer junction; vibrating sample magnetometer; Annealing; Bismuth; Crystal microstructure; Crystallization; Electrons; Magnetic force microscopy; Magnetization; Sputtering; Temperature; X-ray diffraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
Type :
conf
DOI :
10.1109/INTMAG.2005.1464312
Filename :
1464312
Link To Document :
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