Numerical simulation of on thermal nanoimprint lithography (NIL) process

Nanoimprint lithography (NIL) relies on a direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations which are set by a light diffraction or a beam scattering. In addition, NIL is expected to realize a low cost and high-throughput production. In this work, we modeled the NIL process and employed commercially available software, COMSOL Multi-physics, for the implementation of our model. In this paper, we report the stress distribution of the polymer deformation process on the imprinting pressure.