Title :
An improved deep sub-micron MOSFET RF nonlinear model with new breakdown current model and drain to substrate nonlinear coupling
Author :
Heo, D. ; Gebara, E. ; Chen, E. ; Yoo, S. ; Hamai, M. ; Laskar, J.
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
An improved deep sub-micron (0.25 /spl mu/m) MOSFET RF large signal model that incorporates a new breakdown current model and drain to substrate nonlinear coupling was developed and investigated with various experiments. An accurate breakdown model is required for a deep submicron MOSFET due to its relatively low breakdown voltage. For the first time, this improved RF nonlinear model incorporates the breakdown voltage turnover behavior into a continuously differentiable channel current model, and the new nonlinear coupling network between the drain and lossy substrate. The robustness of the model was verified with measured pulsed I-V, S-parameters, power characteristics and inter-modulation distortions at different input and output matching conditions, operating biases, and frequencies.
Keywords :
MOSFET; semiconductor device breakdown; semiconductor device models; 0.25 micron; RF nonlinear model; breakdown current model; deep submicron MOSFET; drain-to-substrate nonlinear coupling; large-signal characteristics; Breakdown voltage; Couplings; Distortion measurement; Electric breakdown; MOSFET circuits; Power measurement; Pulse measurements; RF signals; Radio frequency; Robustness;
Conference_Titel :
Microwave Symposium Digest. 2000 IEEE MTT-S International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-5687-X
DOI :
10.1109/MWSYM.2000.863289