• DocumentCode
    3542168
  • Title

    Pulse width degradation in 45nm ASIC design due to global and environmental variations

  • Author

    Chawla, Tarun ; Marchal, Sebastien ; Amara, Amara ; Vladimirescu, Andrei

  • Author_Institution
    STMicroelectronics, Crolles, France
  • fYear
    2009
  • fDate
    19-22 Dec. 2009
  • Firstpage
    308
  • Lastpage
    311
  • Abstract
    Global and Environmental variations together are responsible for differences in timing from one die to another for an ASIC design. The tried and tested method of corners and margins is still the dominant method in ASIC industry to assure the timing characteristics of a design. However, the increasing margins limit the scaling of maximum achievable frequency for a given die size, especially because of minimum pulse width violation. The importance of clock tree pulse-width variations due to global N-to-P mismatch is increasing with decreasing pulse width. To continue scaling the clock frequency, we may need to make application specific margins and corners. In this work, we have estimated the impact of pulse width variations on standard cells in a clock library using industrial models and spice simulations. We found that by unbalancing the first stage of a cell with respect to rise and fall edge in a multiple supply voltage design, we could halve the pulse width variations with minimal effect on delay and slew.
  • Keywords
    application specific integrated circuits; clocks; digital integrated circuits; integrated circuit design; ASIC design; N-to-P mismatch; clock frequency; clock library; clock tree pulse width variations; die size; minimum pulse width violation; pulse width degradation; timing characteristics; wavelength 45 nm; Application specific integrated circuits; Clocks; Degradation; Delay effects; Frequency; Libraries; Space vector pulse width modulation; Testing; Timing; Voltage; Clock tree pulse width; global N-to-P mismatch;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics (ICM), 2009 International Conference on
  • Conference_Location
    Marrakech
  • Print_ISBN
    978-1-4244-5814-1
  • Type

    conf

  • DOI
    10.1109/ICM.2009.5418624
  • Filename
    5418624