DocumentCode :
3543280
Title :
Conduction investigation in oxide-based resistive random access memory with low frequency noise analysis
Author :
Fang, Zhou ; Wang, X.P. ; Lo, G.Q. ; Kwong, D.L.
Author_Institution :
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear :
2012
fDate :
Oct. 31 2012-Nov. 2 2012
Firstpage :
19
Lastpage :
21
Abstract :
Current conduction of different resistance states has been studied with low frequency noise analysis in this work. A model consisting of two parallel resistances from conductive filament and uniform leakage oxide is proposed to represent the conduction in filament type switching resistive random access memory cell. It is found that in the low resistance regime, filament resistance dominates current conduction and noise behavior which varies nearly to the square of resistance variable; while in the high resistance regime, uniform oxide leakage is the major source of conduction, it gives a nearly constant noise level.
Keywords :
circuit noise; random-access storage; conductive filament; current conduction; filament type switching resistive random access memory cell; low frequency noise analysis; oxide-based resistive random access memory; parallel resistances; resistance states; uniform leakage oxide; Data models; Fitting; Hafnium compounds; Low-frequency noise; Resistance; Switches; RRAM; current conduction; low frequency noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium (NVMTS), 2012 12th Annual
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-2847-0
Type :
conf
DOI :
10.1109/NVMTS.2013.6632853
Filename :
6632853
Link To Document :
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