• DocumentCode
    3543280
  • Title

    Conduction investigation in oxide-based resistive random access memory with low frequency noise analysis

  • Author

    Fang, Zhou ; Wang, X.P. ; Lo, G.Q. ; Kwong, D.L.

  • Author_Institution
    Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
  • fYear
    2012
  • fDate
    Oct. 31 2012-Nov. 2 2012
  • Firstpage
    19
  • Lastpage
    21
  • Abstract
    Current conduction of different resistance states has been studied with low frequency noise analysis in this work. A model consisting of two parallel resistances from conductive filament and uniform leakage oxide is proposed to represent the conduction in filament type switching resistive random access memory cell. It is found that in the low resistance regime, filament resistance dominates current conduction and noise behavior which varies nearly to the square of resistance variable; while in the high resistance regime, uniform oxide leakage is the major source of conduction, it gives a nearly constant noise level.
  • Keywords
    circuit noise; random-access storage; conductive filament; current conduction; filament type switching resistive random access memory cell; low frequency noise analysis; oxide-based resistive random access memory; parallel resistances; resistance states; uniform leakage oxide; Data models; Fitting; Hafnium compounds; Low-frequency noise; Resistance; Switches; RRAM; current conduction; low frequency noise;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium (NVMTS), 2012 12th Annual
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4673-2847-0
  • Type

    conf

  • DOI
    10.1109/NVMTS.2013.6632853
  • Filename
    6632853