DocumentCode
3543280
Title
Conduction investigation in oxide-based resistive random access memory with low frequency noise analysis
Author
Fang, Zhou ; Wang, X.P. ; Lo, G.Q. ; Kwong, D.L.
Author_Institution
Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
fYear
2012
fDate
Oct. 31 2012-Nov. 2 2012
Firstpage
19
Lastpage
21
Abstract
Current conduction of different resistance states has been studied with low frequency noise analysis in this work. A model consisting of two parallel resistances from conductive filament and uniform leakage oxide is proposed to represent the conduction in filament type switching resistive random access memory cell. It is found that in the low resistance regime, filament resistance dominates current conduction and noise behavior which varies nearly to the square of resistance variable; while in the high resistance regime, uniform oxide leakage is the major source of conduction, it gives a nearly constant noise level.
Keywords
circuit noise; random-access storage; conductive filament; current conduction; filament type switching resistive random access memory cell; low frequency noise analysis; oxide-based resistive random access memory; parallel resistances; resistance states; uniform leakage oxide; Data models; Fitting; Hafnium compounds; Low-frequency noise; Resistance; Switches; RRAM; current conduction; low frequency noise;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Memory Technology Symposium (NVMTS), 2012 12th Annual
Conference_Location
Singapore
Print_ISBN
978-1-4673-2847-0
Type
conf
DOI
10.1109/NVMTS.2013.6632853
Filename
6632853
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