• DocumentCode
    3543942
  • Title

    Resonant-body silicon nanowire field effect transistor without junctions

  • Author

    Bartsch, Sebastian T. ; Dupre, C. ; Ollier, E. ; Ionescu, A.M.

  • Author_Institution
    Nanoelectronic Devices Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
  • fYear
    2012
  • fDate
    10-13 Dec. 2012
  • Abstract
    We demonstrate the first implementation of a highly doped, silicon nanowire electromechanical resonator that exploits the depletion charge modulation in a junctionless FET to transduce mechanical motion on-chip. The resonator, with a typical length between 1 and 2 μm, a total height of 45 nm and a total width of 65 nm, is coupled via two lateral 60 nm air-gap gate electrodes. A fundamental resonance frequency of up to 226 MHz is detected in the drain current. This device is integrated in an FD-SOI-CMOS platform using conventional 8" inch wafer technology, which offers unique opportunities for compact sensing platforms interfaced with CMOS on a single chip.
  • Keywords
    CMOS integrated circuits; UHF field effect transistors; elemental semiconductors; nanowires; radiofrequency integrated circuits; resonators; silicon; silicon-on-insulator; FD-SOI-CMOS platform; air-gap gate electrodes; compact sensing platforms; depletion charge modulation; highly doped silicon nanowire electromechanical resonator; junctionless FET; resonant-body silicon nanowire field effect transistor; size 1 mum to 2 mum; size 65 nm; size 8 inch; transduce mechanical motion on-chip; wafer technology; Field effect transistors; Frequency modulation; Logic gates; Nanoelectromechanical systems; Resonant frequency; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2012 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4673-4872-0
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2012.6479046
  • Filename
    6479046