DocumentCode
3543942
Title
Resonant-body silicon nanowire field effect transistor without junctions
Author
Bartsch, Sebastian T. ; Dupre, C. ; Ollier, E. ; Ionescu, A.M.
Author_Institution
Nanoelectronic Devices Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
fYear
2012
fDate
10-13 Dec. 2012
Abstract
We demonstrate the first implementation of a highly doped, silicon nanowire electromechanical resonator that exploits the depletion charge modulation in a junctionless FET to transduce mechanical motion on-chip. The resonator, with a typical length between 1 and 2 μm, a total height of 45 nm and a total width of 65 nm, is coupled via two lateral 60 nm air-gap gate electrodes. A fundamental resonance frequency of up to 226 MHz is detected in the drain current. This device is integrated in an FD-SOI-CMOS platform using conventional 8" inch wafer technology, which offers unique opportunities for compact sensing platforms interfaced with CMOS on a single chip.
Keywords
CMOS integrated circuits; UHF field effect transistors; elemental semiconductors; nanowires; radiofrequency integrated circuits; resonators; silicon; silicon-on-insulator; FD-SOI-CMOS platform; air-gap gate electrodes; compact sensing platforms; depletion charge modulation; highly doped silicon nanowire electromechanical resonator; junctionless FET; resonant-body silicon nanowire field effect transistor; size 1 mum to 2 mum; size 65 nm; size 8 inch; transduce mechanical motion on-chip; wafer technology; Field effect transistors; Frequency modulation; Logic gates; Nanoelectromechanical systems; Resonant frequency; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4673-4872-0
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2012.6479046
Filename
6479046
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