DocumentCode :
3543959
Title :
VLSI platform for the monolithic integration of single-crystal Si NEMS capacitive resonators with low-cost CMOS
Author :
Arcamone, J. ; Savoye, Mylene ; Arndt, Gregory ; Philippe, Julien ; Marcoux, C. ; Colinet, E. ; Duraffourg, L. ; Magis, T. ; Laurens, M. ; Monroy-Aguirre, A. ; Mazoyer, P. ; Ancey, P. ; Robert, Philippe ; Ollier, E.
Author_Institution :
CEA, LETI, Grenoble, France
fYear :
2012
fDate :
10-13 Dec. 2012
Abstract :
This work constitutes the first demonstration of monolithic integration of single-crystal silicon capacitive NEMS resonators with CMOS. With this approach, the efficiency of the electrical detection of the NEMS motion is outstanding and achieved with only seven transistors that are fabricated with a completely unmodified and very low-cost 0.35μm bulk CMOS technology.
Keywords :
CMOS integrated circuits; VLSI; elemental semiconductors; micromechanical resonators; nanoelectromechanical devices; nanofabrication; silicon; NEMS motion; Si; VLSI platform; electrical detection; low-cost bulk CMOS technology; monolithic integration; single-crystal silicon capacitive NEMS resonators; size 0.35 mum; CMOS integrated circuits; CMOS technology; Capacitance; Nanoelectromechanical systems; Resonant frequency; Silicon; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
ISSN :
0163-1918
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.2012.6479048
Filename :
6479048
Link To Document :
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