Title :
A non-linear ReRAM cell with sub-1μA ultralow operating current for high density vertical resistive memory (VRRAM)
Author :
Seong-Geon Park ; Min Kyu Yang ; Hyunsu Ju ; Dong-Jun Seong ; Jung Moo Lee ; Eunmi Kim ; Seungjae Jung ; Lijie Zhang ; Yoo Cheol Shin ; In-Gyu Baek ; Jungdal Choi ; Ho-Kyu Kang ; Chilhee Chung
Author_Institution :
Semicond. R&D Center, Samsung Electron. Co. Ltd., Hwasung, South Korea
Abstract :
A non-linear RRAM cell with sub-1μA ultralow operating current has been successfully fabricated for high density vertical ReRAM (VRRAM) applications. A uniform and reproducible low power resistive switching was achieved by engineering transition metal oxides and imposing thin insulating layer as a tunnel barrier. The non-linear I-V characteristics ensure the possible incorporation of RRAM cell into high density cross-type array structure including VRRAM. By varying the current compliance, a multi level switching behavior was obtained. Moreover, excellent endurance of more than 107 cycles without read disturbance for up to 104 seconds was demonstrated.
Keywords :
low-power electronics; random-access storage; VRRAM; current 1 muA; current compliance; engineering transition metal oxides; high density cross-type array structure; high density vertical ReRAM; high density vertical resistive memory; low power resistive switching; multi level switching behavior; nonlinear I-V characteristics; nonlinear RRAM cell; nonlinear ReRAM cell; thin insulating layer; tunnel barrier; ultralow operating current; Arrays; Electrodes; Flash memory; Metals; Resistance; Switches; Writing;
Conference_Titel :
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4673-4872-0
Electronic_ISBN :
0163-1918
DOI :
10.1109/IEDM.2012.6479084