PPPS-2013: Infrared gas phase studies and scaling parameters in PE-CVD processes at atmospheric pressure using high-current dielectric barrier discharges

Author

Welzel, S. ; Engeln, R. ; Starostin, S.A. ; de Vries, H. ; van de Sanden, Mauritius C. M.

Author_Institution

Eindhoven Univ. of Technol., Eindhoven, Netherlands

fYear

2013

fDate

16-21 June 2013

Firstpage

1

Lastpage

1

Abstract

Plasma-enhanced chemical vapour deposition (PE-CVD) of silica-like layers at atmospheric pressure onto large-area polymeric substrates has been shown to yield high-quality barrier layers. A key requirement is to achieve a diffusive discharge mode in industrially relevant air-like gas mixtures (N₂/O₂/Ar) without admixtures of Helium. An electronic stabilisation enables high discharge currents (several A) to be achieved.

Keywords

Fourier transform spectra; density; dissociation; etching; infrared spectra; plasma CVD; silicon compounds; thin films; time resolved spectra; HCOOH; PE-CVD; SiO₂; air-like gas mixtures; density; diffusive discharge mode; discharge currents; dissociation; etching; films; formic acid; high-current dielectric barrier discharges; high-current plasmas; infrared gas phase; mean energy; plasma-enhanced chemical vapour deposition; polymeric substrate; pulsed quantum cascade lasers; reactor constant; scaling parameters; silica-like layers; time-resolved in-situ IR laser spectroscopy; Chemicals; Etching; Films; Polymers; Quantum cascade lasers; Spectroscopy; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on

Conference_Location

San Francisco, CA

ISSN

0730-9244

Type

conf

DOI

10.1109/PLASMA.2013.6633185

Filename

6633185