• DocumentCode
    3544448
  • Title

    Technology assessment of Si and III-V FinFETs and III-V tunnel FETs from soft error rate perspective

  • Author

    Huichu Liu ; Cotter, Matthew ; Datta, Soupayan ; Narayanan, Vijaykrishnan

  • Author_Institution
    Dept. of Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
  • fYear
    2012
  • fDate
    10-13 Dec. 2012
  • Abstract
    Sea-level soft error performance has been investigated for Si FinFET, III-V FinFET and III-V Heterojunction Tunnel FET in this paper. Transient error generation and transient current profiles in these devices have been evaluated using device simulation. Based on the critical charge extraction for each emerging device-based circuit, the electrical and latching window masking effects have been studied. Below 0.5V, III-V FinFET logic shows reduced soft error rate (SER) compared to Si FinFET. HTFET shows reduced SER for both SRAM and logic compared to Si and III-V FinFET over the evaluated voltage range of 0.3V-0.6V.
  • Keywords
    III-V semiconductors; MOSFET; FinFET logic; SRAM; critical charge extraction; device based circuit; device simulation; heterojunction tunnel FET; latching window masking effect; reduced soft error rate; sea level soft error performance; technology assessment; transient current profiles; transient error generation; voltage 0.3 V to 0.6 V; FinFETs; Latches; Neutrons; SRAM cells; Silicon; Transient analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2012 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4673-4872-0
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2012.6479103
  • Filename
    6479103