Fabrication and experimental demonstration of a multichannel module for intra-MCM optical interconnects

Author

Verschaffelt, G. ; Buczynski, Ryszard ; Tuteleers, P. ; Vynck, P. ; Baukens, V. ; Ottevaere, Heidi ; Kufner, S. ; Kufner, M. ; Hermanne, A. ; Genoe, Jan ; Coppee, D. ; Vounckx, Roger ; Heremans, Paul ; Thienpont, Hugo ; Veretennicoff, Irina

Author_Institution

Vrije Univ., Brussels, Belgium

fYear

1998

fDate

3-8 May 1998

Firstpage

351

Lastpage

352

Abstract

Summary form only given. We use deep proton irradiation of poly(methyl methacrylate) (PMMA) as a deep-etch lithographic technique that allows us to fabricate monolithic structures integrating refractive microlenses, micromirrors, fiber positioning holes, standoffs, and alignment features. The technique works as follows: a proton beam in the energy range between 5 and 10 MeV, passing through a metal mask, impinges on a high-molecular-weight PMMA substrate.

Keywords

integrated circuit technology; microlenses; multichip modules; optical fabrication; optical interconnections; PMMA; alignment features; deep proton irradiation; deep-etch lithographic technique; energy range; fiber positioning holes; high-molecular-weight PMMA substrate; intra-MCM optical interconnects; metal mask; micromirrors; multichannel module; poly(methyl methacrylate); proton beam; refractive microlenses; standoffs; Bridges; Integrated circuit interconnections; Lenses; Micromirrors; Microoptics; Optical device fabrication; Optical interconnections; Optical transmitters; Semiconductor laser arrays; Vertical cavity surface emitting lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on

Conference_Location

San Francisco, CA, USA

Print_ISBN

1-55752-339-0

Type

conf

DOI

10.1109/CLEO.1998.676285

Filename

676285