DocumentCode
3544597
Title
Experimental study of self-heating effect (SHE) in SOI MOSFETs: Accurate understanding of temperatures during AC conductance measurement, proposals of 2ω method and modified pulsed IV
Author
Beppu, N. ; Oda, Shoichiro ; Uchida, Kazunori
Author_Institution
Dept. of Phys. Electron., Tokyo Inst. of Technol., Tokyo, Japan
fYear
2012
fDate
10-13 Dec. 2012
Abstract
In this paper, a new method for accurate characterization of MOSFETs´ thermal properties is proposed. First, experimental verification of conventional AC conductance technique is conducted. We developed novel measurement techniques composed of AC conductance technique and four-probe gate resistance method. Using the new technique, it is clarified that MOSFETs´ channel temperature under AC conductance measurement is not isothermal because of “Static SHE”, and that AC conductance technique is not suitable for complete thermal characterization. Next, we modified conventional pulsed IV method. It enables us to determine accurate channel thermal resistance and to obtain isothermal IV curve. The new pulsed IV method enables to measure accurate thermal properties of the devices.
Keywords
MOSFET; electric admittance measurement; silicon-on-insulator; thermal properties; 2ω method; AC conductance measurement; SOI MOSFET; accurate thermal property measurement; channel thermal resistance; four-probe gate resistance method; isothermal IV curve; modified pulsed IV method; self-heating effect; static SHE; Electrical resistance measurement; Frequency measurement; Hafnium; Isothermal processes; Logic gates; Resistance; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4673-4872-0
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2012.6479120
Filename
6479120
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