DocumentCode
3544652
Title
Impact of stray field on the switching properties of perpendicular MTJ for scaled MRAM
Author
Yung-Hung Wang ; Sheng-Huang Huang ; Ding-Yeong Wang ; Kuei-Hung Shen ; Cheng-Wei Chien ; Keng-Ming Kuo ; Shan-Yi Yang ; Duan-Li Deng
Author_Institution
Electron. & Optoelectron. Res. Labs. (EOL), Ind. Technol. Res. Inst. (ITRI), Hsinchu, Taiwan
fYear
2012
fDate
10-13 Dec. 2012
Abstract
For the first time, we show the stray field (Hs) from the pinned layer of perpendicular magnetic tunnel junctions (pMTJs) plays multiple important roles: its out-of-plane component degrades pinned layer stability of scaled MTJ, while its in-plane component assists spin-transfer torque switching. Through stray field engineering, one can retain its advantage, and minimized its detrimental effect. We also show that etching process plays a vital role in the stray-field engineering. Our pMTJ exhibits robust pinned layer performance, symmetrical R-H loop and balanced spin-torque switching current. The switching current of our pMTJ is ~60uA@20us for a 80nm diameter pMTJ.
Keywords
MRAM devices; etching; magnetic switching; magnetic tunnelling; perpendicular magnetic anisotropy; torque; balanced spin-torque switching current; detrimental effect; etching process; in-plane component; out-of-plane component degrades; perpendicular MTJ; perpendicular magnetic tunnel junctions; pinned layer stability; robust pinned layer performance; scaled MRAM; size 80 nm; spin-transfer torque switching; stray field engineering; switching properties; symmetrical R-H loop; Energy barrier; Etching; Junctions; Magnetic switching; Magnetic tunneling; Switches; Torque;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4673-4872-0
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2012.6479127
Filename
6479127
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