DocumentCode
3544709
Title
Improved understanding of electron density and temperature in a low pressure VHF-CCP from kinetic simulation
Author
Stoltz, P.H. ; Fiebrandt, Marcel ; Stapelmann, Katharina ; Awakowicz, Peter
Author_Institution
Tech-X Corp., Boulder, CO, USA
fYear
2013
fDate
16-21 June 2013
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Low pressure capacitively coupled plasma discharges are a promising plasma for biomedical applications. However, in recent experiments using a hydrogen gas, electron densities and temperatures from two measurements (multipole resonance probe and optical emission spectroscopy) disagree. Possible explanations for this disagreement include negative ion formation and non-thermal velocity distributions. We use kinetic plasma modeling to help understand this disagreement. In particular we show the effect of the rate of negative ion formation on the overall plasma density, and we estimate the effect of non-thermal electrons on the temperature diagnostics.
Keywords
discharges (electric); plasma density; plasma diagnostics; plasma kinetic theory; plasma pressure; plasma simulation; plasma temperature; electron density; electron temperature; kinetic plasma modeling; low pressure VHF-CCP; low pressure capacitively coupled plasma discharges; multipole resonance probe; negative ion formation; nonthermal velocity distributions; optical emission spectroscopy; plasma density; temperature diagnostics;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6633234
Filename
6633234
Link To Document