DocumentCode
3544879
Title
Characterization of chip-level hetero-integration technology for high-speed, highly parallel 3D-stacked image processing system
Author
Lee, Ki-Won ; Ohara, Yuki ; Kiyoyama, K. ; Konno, Shuji ; Sato, Yuuki ; Watanabe, Shigetaka ; Yabata, A. ; Kamada, Tomonari ; Bea, J.-C. ; Hashimoto, Hiroya ; Murugesan, Mariappan ; Fukushima, Tetsuya ; Tanaka, T. ; Koyanagi, Mitsumasa
Author_Institution
New Ind. Creation Hatchery Center (NICHe), Tohoku Univ., Sendai, Japan
fYear
2012
fDate
10-13 Dec. 2012
Abstract
We demonstrate the chip-based 3D heterogeneous integration technology for realizing highly parallel 3D-stacked image sensor. Three kinds of chips, CMOS image sensor chip, analog circuit chip, and ADC array chip, which were fabricated by different technologies, are processed and stacked vertically to form a prototype 3D-stacked image sensor. Through-Si vias (TSVs) and metal micro-bumps are formed in chip-level before stacking. The fundamental characteristics are evaluated in the fabricated prototype 3D-stacked image sensor.
Keywords
CMOS image sensors; image processing; three-dimensional integrated circuits; ADC array chip; CMOS image sensor chip; TSV; analog circuit chip; chip-based 3D heterogeneous integration technology; high-speed 3D-stacked image processing; highly parallel 3D-stacked image processing; metal micro-bumps; parallel 3D-stacked image sensor; through-Si vias; Image processing; Image sensors; Prototypes; Silicon; Through-silicon vias; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2012 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4673-4872-0
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2012.6479156
Filename
6479156
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