DocumentCode
3545087
Title
The dominant role of oxygen concentration in He+O2 atmosp heric-pressure cold plasmas
Author
Xiaohua Wang ; Aijun Yang ; Dingxin Liu ; Mingzhe Rong ; Kong, Michael
Author_Institution
State key Lab. of Electr. insulation & power Equip., Xi´an Jiaotong Univ., Xi´an, China
fYear
2013
fDate
16-21 June 2013
Firstpage
1
Lastpage
1
Abstract
Summary form only given. He+O2 atmospheric-pressure cold plasmas have received much attention; mainly rely on the potential use of reactive oxygen species generated in such plasmas. In this paper we present the impact of oxygen concentration from 0ppm to 5% on the discharge modes, power dissipation, chemical composition and electrode fluxes of plasma species in He+O2 atmospheric-pressure cold plasmas with a constant power density of 40W/cm3. It is found the discharge evolves from α mode to γ mode with the increase of oxygen concentration. The power coupled into electrons dominates in plasma bulk for all oxygen concentration, while the power coupled into ions dominates in the sheath below 10000ppm and in plasma bulk above 10000ppm. The power coupled into electrons dominates over the power coupled into ions below 20000ppm, as is opposite above 20000ppm. O- is the dominant anion below 3000ppm and replaced by O3- at higher oxygen concentration, while O- is always dominant in the electrode fluxes of anions for all oxygen concentration. O2+ is dominant in the densities and electrode fluxes of cations below 10000ppm and replaced by O4+ at higher oxygen concentration.
Keywords
chemical analysis; discharges (electric); helium; negative ions; oxygen; plasma chemistry; plasma sheaths; positive ions; He+; O2+; O3-; O4+; O-; anion; atmospheric pressure cold plasma; cation; chemical composition; constant power density; discharge mode; electrode flux; electron; plasma bulk; plasma species; power dissipation; pressure 1 atm; reactive oxygen species; sheath; Computers; Discharges (electric); Educational institutions; Electrodes; Insulation; Ions; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6633287
Filename
6633287
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