• DocumentCode
    3545087
  • Title

    The dominant role of oxygen concentration in He+O2 atmosp heric-pressure cold plasmas

  • Author

    Xiaohua Wang ; Aijun Yang ; Dingxin Liu ; Mingzhe Rong ; Kong, Michael

  • Author_Institution
    State key Lab. of Electr. insulation & power Equip., Xi´an Jiaotong Univ., Xi´an, China
  • fYear
    2013
  • fDate
    16-21 June 2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. He+O2 atmospheric-pressure cold plasmas have received much attention; mainly rely on the potential use of reactive oxygen species generated in such plasmas. In this paper we present the impact of oxygen concentration from 0ppm to 5% on the discharge modes, power dissipation, chemical composition and electrode fluxes of plasma species in He+O2 atmospheric-pressure cold plasmas with a constant power density of 40W/cm3. It is found the discharge evolves from α mode to γ mode with the increase of oxygen concentration. The power coupled into electrons dominates in plasma bulk for all oxygen concentration, while the power coupled into ions dominates in the sheath below 10000ppm and in plasma bulk above 10000ppm. The power coupled into electrons dominates over the power coupled into ions below 20000ppm, as is opposite above 20000ppm. O- is the dominant anion below 3000ppm and replaced by O3- at higher oxygen concentration, while O- is always dominant in the electrode fluxes of anions for all oxygen concentration. O2+ is dominant in the densities and electrode fluxes of cations below 10000ppm and replaced by O4+ at higher oxygen concentration.
  • Keywords
    chemical analysis; discharges (electric); helium; negative ions; oxygen; plasma chemistry; plasma sheaths; positive ions; He+; O2+; O3-; O4+; O-; anion; atmospheric pressure cold plasma; cation; chemical composition; constant power density; discharge mode; electrode flux; electron; plasma bulk; plasma species; power dissipation; pressure 1 atm; reactive oxygen species; sheath; Computers; Discharges (electric); Educational institutions; Electrodes; Insulation; Ions; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6633287
  • Filename
    6633287