DocumentCode
3545641
Title
Bragg gratings in hollow-cathode PECVD germanosilica planar waveguides
Author
Moss, D. ; Canning, J. ; Bazylenko, M.
Author_Institution
Australian Photonics Cooperative Res. Centre, Eveleigh, NSW, Australia
fYear
1998
fDate
3-8 May 1998
Firstpage
425
Abstract
Summary form only given. We report, for the first lime, waveguide gratings fabricated in intrinsically low-loss (0.2 dB/cm with no annealing) germanosilica waveguide layers without the use of any material presensitization. The waveguides were grown by a novel technique called hollow-cathode PECVD, which, unlike conventional PECVD, can produce low-loss waveguides without the need to postanneal films.
Keywords
Bragg gratings; cathodes; optical fabrication; optical losses; optical planar waveguides; plasma CVD; Bragg gratings; GeO/sub 2/-SiO/sub 2/; hollow-cathode PECVD; hollow-cathode PECVD germanosilica planar waveguides; intrinsically low-loss germanosilica waveguide layers; low-loss waveguides; optical fabrication; optical films; waveguide gratings; Annealing; Bragg gratings; Canning; Electrons; Fiber nonlinear optics; Optical fiber polarization; Optical films; Optical waveguides; Planar waveguides; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-339-0
Type
conf
DOI
10.1109/CLEO.1998.676447
Filename
676447
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