DocumentCode :
3545835
Title :
Radiographic characteristics of the self-magnetic pinch diode at RITS-6 and URSA-Minor
Author :
Webb, Timothy J. ; Leckbee, Joshua J. ; Oliver, Bryan V.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fYear :
2013
fDate :
16-21 June 2013
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. The self-magnetic pinch (SMP) diode1 is an intense flash x-ray radiographic source being developed at Sandia National Laboratories. The diode is capable of less than 3 mm spots and greater than 300 rads measured at 1 meter depending on the diode voltage. The diode is most commonly fielded on the Radiographic Integrated Test Stand (RITS-6), a 7.5 M V, 185 kA inductive voltage adder (IVA) accelerator and has also been tested on the URSA-Minor accelerator, an I VA based on the linear transformer driver (LTD) pulsed power generator at 0.9 and 2 M V. Various test objects including step wedges and resolution targets are used to study the spatial resolution and spectral characteristics of the radiographic system which of necessity include the x-ray source, shielding, and the detector system. These properties can be used to make general predictions of radiographic performance.
Keywords :
X-ray apparatus; X-ray detection; X-ray production; electromagnetic induction; pulse generators; pulsed power supplies; radiography; shielding; Radiographic Integrated Test Stand RITS-6; Sandia National Laboratories; URSA-Minor accelerator; current 185 kA; detector system; diode voltage; inductive voltage adder accelerator; intense flash X-ray radiographic source; linear transformer driver pulsed power generator; radiographic characteristics; radiographic performance; radiographic system; resolution targets; self-magnetic pinch diode; shielding; spatial resolution; spectral characteristics; step wedges; test objects; voltage 0.9 MV; voltage 2 MV; voltage 7.5 MV; Adders; Laboratories; Life estimation; Magnetic field measurement; Radiography; Spatial resolution; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2013.6633381
Filename :
6633381
Link To Document :
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