DocumentCode
3546185
Title
High power pulse plasma generator with oscillatory voltage waveforms for magnetron sputtering applications
Author
Chistyakov, Roman ; Abraham, Bassam
Author_Institution
Zond Inc. /Zpulser LLC, Mansfield, MA, USA
fYear
2013
fDate
16-21 June 2013
Firstpage
1
Lastpage
1
Abstract
Magnetron sputtering technology is widely used for the deposition of thin films for different applications. The properties of the sputtered films (metal, oxides, and nitrides) strongly depend on magnetron plasma density during the deposition process.
Keywords
sputter deposition; sputtered coatings; HIPIMS; high power impulse magnetron sputtering; high power pulse plasma generator; magnetron plasma density; magnetron sputtering technology; oscillatory voltage waveforms; sputtered thin films; target power density; voltage 1000 V to 2000 V; Magnetic films; Magnetic properties; Metals; Plasma properties; Shape; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6633435
Filename
6633435
Link To Document