PPPS-2013: Emittance and emission from arrays with statistical variation

Author

Petillo, John J. ; Panagos, Dimitrios N. ; Jensen, Kevin L.

Author_Institution

Sci. Applic. Int. Corp., Billerica, MA, USA

fYear

2013

fDate

16-21 June 2013

Firstpage

1

Lastpage

1

Abstract

Summary form only given. We report on the incorporation of a model of field emitters based on a Point Charge Model (PCM)¹ that allows for rapid and analytical representations of tip current, variation, and emission statistics and its implementation and usage in the MICHELLE Particle-In-Cell (PIC) code² to model the impact of emission variation on current characteristics and emittance. Rather than cold field emission characterized by the Fowler Nordheim equation, a General Thermal-Field (GTF) emission model³ treats warm and hot field emission sources. We shall compare the increases in emittance and beam radius due to emission non-uniformity as modeled by assuming a LogNormal (LN) distribution of emitter geometries⁴. The consequences for high frequency devices shall be explored.

Keywords

field emission; geometry; log normal distribution; statistical analysis; Fowler Nordheim equation; GTF; LN; MICHELLE particle-in-cell code; PCM; PIC; beam radius; cold field emission source; general thermal-field emission model; geometry; lognormal distribution; point charge model; statistical variation; Analytical models; Equations; Field emitter arrays; Laboratories; Mathematical model; Space charge; Vacuum technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on

Conference_Location

San Francisco, CA

ISSN

0730-9244

Type

conf

DOI

10.1109/PLASMA.2013.6633506

Filename

6633506