• DocumentCode
    3547268
  • Title

    Bistability under tension and its use in a threshold force sensor

  • Author

    Rabanim, S. ; Amir, E. ; Schreiber, D. ; Krylov, S.

  • Author_Institution
    Microsyst. Design & Characterization Lab., Tel Aviv Univ., Tel Aviv, Israel
  • fYear
    2012
  • fDate
    Jan. 29 2012-Feb. 2 2012
  • Firstpage
    1137
  • Lastpage
    1140
  • Abstract
    We report on a first experimental demonstration of a bistability phenomenon in a contactless device suspended using initially curved flexible beams and pulled by electrostatic forces directed along the beams. Devices of several configurations were fabricated from a silicon on insulator (SOI) substrate using a deep reactive ion etching (DRIE) based process and were actuated in-plane in ambient air conditions. We introduce a novel, less sensitive to the fabrication tolerances, operational scenario involving actuation by two parallel-plate electrodes and demonstrate that the bistable device can be used as a force sensor based on a pull-in voltage monitoring.
  • Keywords
    electrodes; force sensors; microsensors; silicon-on-insulator; sputter etching; ambient air condition; bistability phenomenon; bistable device; contactless device; deep reactive ion etching based process; electrostatic force; fabrication tolerance; flexible beam; parallel-plate electrode; pull-in voltage monitoring; silicon-on-insulator substrate; threshold force sensor; Accelerometers; Electrodes; Electrostatics; Force; Sensors; Suspensions; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2012 IEEE 25th International Conference on
  • Conference_Location
    Paris
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4673-0324-8
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2012.6170363
  • Filename
    6170363