Dynamic grating formation in As/sub 2/S/sub 3/

Author

Ramachandran, Siddharth ; Bishop, S.G. ; Brady, David J.

Author_Institution

Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA

fYear

1996

fDate

2-7 June 1996

Firstpage

259

Lastpage

260

Abstract

Summary form only given. This work focuses on using the photoexpansion effect to fabricate surface-grating structures and studying their applicability in photonic circuitry. Surface gratings with periods ranging from 2.95 /spl mu/m to 0.377 /spl mu/m were written holographically using 514.5-nm light from an argon ion laser. Gratings with 2.95 /spl mu/m period were also written for different exposure times to study the dose effect on surface-relief structures. Atomic force microscope (AFM) images of the irradiated surfaces were obtained. A He-Ne laser operating at 632.8 nm was used to measure diffraction efficiencies.

Keywords

arsenic compounds; atomic force microscopy; chalcogenide glasses; holographic gratings; optical fabrication; optical glass; optical microscopy; 514.5 nm; 632.8 nm; Ar; As/sub 2/S/sub 3/; He-Ne; He-Ne laser; atomic force microscopy; diffraction efficiencies; dose effect; dynamic grating formation; fabrication; holography; irradiated surfaces; photoexpansion effect; photonic circuitry; surface gratings; surface-grating structures; surface-relief structures; Absorption; Crystals; Diffraction gratings; Electrons; Holography; Laser beams; Laser tuning; Optimized production technology; Photorefractive materials; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on

Conference_Location

Anaheim, CA, USA

Print_ISBN

1-55752-443-2

Type

conf

Filename

864642