DocumentCode :
354937
Title :
Highly uniform and reproducible vertical-cavity surface-emitting lasers grown by metalorganic chemical vapor deposition
Author :
Hou, H.Q. ; Chui, H.C. ; Choquette, Kent D. ; Hammons, B.E. ; Brieland, W.G. ; Geib, Kent M.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fYear :
1996
fDate :
2-7 June 1996
Firstpage :
279
Lastpage :
280
Abstract :
Summary form only given. Metalorganic chemical vapor deposition (MOCVD) technology is increasingly recognized as a superior platform for growth of vertical-cavity surface-emitting lasers (VCSELs) because of its high throughput, low surface defect density, continuous compositional grading control, and the flexibility for materials and dopant choices. In this paper, we show that it is also capable of extremely high wafer uniformity and run-to-run reproducibility.
Keywords :
chemical vapour deposition; optical fabrication; surface emitting lasers; growth; metalorganic chemical vapor deposition; run-to-run reproducibility; vertical-cavity surface-emitting laser; wafer uniformity; Chemical lasers; Chemical technology; Chemical vapor deposition; Composite materials; Inorganic materials; MOCVD; Optical control; Surface emitting lasers; Throughput; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
1-55752-443-2
Type :
conf
Filename :
864672
Link To Document :
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