DocumentCode
354937
Title
Highly uniform and reproducible vertical-cavity surface-emitting lasers grown by metalorganic chemical vapor deposition
Author
Hou, H.Q. ; Chui, H.C. ; Choquette, Kent D. ; Hammons, B.E. ; Brieland, W.G. ; Geib, Kent M.
Author_Institution
Sandia Nat. Labs., Albuquerque, NM, USA
fYear
1996
fDate
2-7 June 1996
Firstpage
279
Lastpage
280
Abstract
Summary form only given. Metalorganic chemical vapor deposition (MOCVD) technology is increasingly recognized as a superior platform for growth of vertical-cavity surface-emitting lasers (VCSELs) because of its high throughput, low surface defect density, continuous compositional grading control, and the flexibility for materials and dopant choices. In this paper, we show that it is also capable of extremely high wafer uniformity and run-to-run reproducibility.
Keywords
chemical vapour deposition; optical fabrication; surface emitting lasers; growth; metalorganic chemical vapor deposition; run-to-run reproducibility; vertical-cavity surface-emitting laser; wafer uniformity; Chemical lasers; Chemical technology; Chemical vapor deposition; Composite materials; Inorganic materials; MOCVD; Optical control; Surface emitting lasers; Throughput; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-443-2
Type
conf
Filename
864672
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