Title :
Negative-source enhanced source-side injection achieving 100-ns cell programming in multilevel flash memories
Author :
Kawamura, T. ; Sasago, Y. ; Kurata, H. ; Otsuga, K. ; Noda, S. ; Kozakai, K. ; Kobayashi, T.
Author_Institution :
Central Res. Lab., Hitachi, Ltd., Tokyo, Japan
Abstract :
An enhanced source-side hot-electron injection scheme for a highspeed programming of multilevel flash memories has been developed. Applying a negative voltage at the source raises hot-electron injection efficiency and cell programming improves 20 times from the conventional scheme, achieving 100-ns cell programming. We have also developed a scheme generating negative source voltage by leveraging the capacitive coupling to achieve a narrow cell-programming-speed distribution along with the high speed.
Keywords :
flash memories; hot carriers; capacitive coupling; cell programming; highspeed programming; hot-electron injection; multilevel flash memories; negative source voltage; negative-source enhanced source-side injection; Committee on Communications and Information Policy; Electronic mail; Flash memory; Intrusion detection; Laboratories; Nonvolatile memory; Secondary generated hot electron injection; Throughput; Velocity measurement; Voltage;
Conference_Titel :
VLSI Technology, 2005. Digest of Technical Papers. 2005 Symposium on
Print_ISBN :
4-900784-00-1
DOI :
10.1109/.2005.1469269