• DocumentCode
    355077
  • Title

    Laser-induced forward transfer of carbon and chromium films in gases of one atmosphere pressure

  • Author

    Poon, C.C. ; Tam, A.C.

  • Author_Institution
    IBM Res. Div., Almaden Res. Center, San Jose, CA, USA
  • fYear
    1996
  • fDate
    2-7 June 1996
  • Firstpage
    377
  • Lastpage
    378
  • Abstract
    Summary form only given. The "Laser-Induced Forward Transfer" (LIFT) technique utilizes pulsed laser irradiation to transfer a thin-film material from an "emitting" surface to a "collecting" surface. Here, we show for the first time that LIFT can produce patterned spots of desired thicknesses, and we also compare ambient gas of air versus helium at one atmosphere pressure. We utilize a focussed pulsed laser beam of high repetition rate to produce localized transfer from the emitting film to the collecting surface with high spatial resolution. The adjustment of the spot thickness is achieved by translating the emitting film after each laser pulse while keeping the irradiation spot and the collecting surface stationary.
  • Keywords
    carbon; chromium; laser materials processing; metallic thin films; thin films; C; Cr; laser-induced forward transfer; pulsed laser irradiation; thin-film material; Atmosphere; Carbon dioxide; Chromium; Gas lasers; Gases; Helium; Optical materials; Optical pulses; Surface emitting lasers; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
  • Conference_Location
    Anaheim, CA, USA
  • Print_ISBN
    1-55752-443-2
  • Type

    conf

  • Filename
    864814