DocumentCode
355077
Title
Laser-induced forward transfer of carbon and chromium films in gases of one atmosphere pressure
Author
Poon, C.C. ; Tam, A.C.
Author_Institution
IBM Res. Div., Almaden Res. Center, San Jose, CA, USA
fYear
1996
fDate
2-7 June 1996
Firstpage
377
Lastpage
378
Abstract
Summary form only given. The "Laser-Induced Forward Transfer" (LIFT) technique utilizes pulsed laser irradiation to transfer a thin-film material from an "emitting" surface to a "collecting" surface. Here, we show for the first time that LIFT can produce patterned spots of desired thicknesses, and we also compare ambient gas of air versus helium at one atmosphere pressure. We utilize a focussed pulsed laser beam of high repetition rate to produce localized transfer from the emitting film to the collecting surface with high spatial resolution. The adjustment of the spot thickness is achieved by translating the emitting film after each laser pulse while keeping the irradiation spot and the collecting surface stationary.
Keywords
carbon; chromium; laser materials processing; metallic thin films; thin films; C; Cr; laser-induced forward transfer; pulsed laser irradiation; thin-film material; Atmosphere; Carbon dioxide; Chromium; Gas lasers; Gases; Helium; Optical materials; Optical pulses; Surface emitting lasers; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-443-2
Type
conf
Filename
864814
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