DocumentCode
3551621
Title
Design of high voltage conductivity modulated silicon rectifiers
Author
Veloric, H.S. ; Prince, M.B.
Volume
2
fYear
1956
fDate
1956
Firstpage
38
Lastpage
38
Abstract
Silicon N+ IP+ diffused junction rectifiers have been made by the diffusion of boron and phosphorus into high resistivity material. Units have been fabricated with breakdown voltage over 2000 volts. The forward current is proportional to exp. (qv/nkt) with 1.2 -n-2 for currents up to 200 amps/cm2. The breakdown Voltage of N+ IP+ structure has been calculated from the avalanche theory of McKay and Wolff and is shown to be a function of the width of the I region. The reverse currents are in the order of 10-6amps/cm2at low bias and increase as the square root of the applied voltage. These relatively large reverse currents can be attributed to Shockley-Read generation in the space charge region.
Keywords
Boron; Conducting materials; Conductivity; Delay estimation; Laboratories; Rectifiers; Semiconductor diodes; Silicon; Telephony; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1956 International
Type
conf
DOI
10.1109/IEDM.1956.187015
Filename
1472161
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