• DocumentCode
    3551621
  • Title

    Design of high voltage conductivity modulated silicon rectifiers

  • Author

    Veloric, H.S. ; Prince, M.B.

  • Volume
    2
  • fYear
    1956
  • fDate
    1956
  • Firstpage
    38
  • Lastpage
    38
  • Abstract
    Silicon N+ IP+ diffused junction rectifiers have been made by the diffusion of boron and phosphorus into high resistivity material. Units have been fabricated with breakdown voltage over 2000 volts. The forward current is proportional to exp. (qv/nkt) with 1.2 -n-2 for currents up to 200 amps/cm2. The breakdown Voltage of N+ IP+ structure has been calculated from the avalanche theory of McKay and Wolff and is shown to be a function of the width of the I region. The reverse currents are in the order of 10-6amps/cm2at low bias and increase as the square root of the applied voltage. These relatively large reverse currents can be attributed to Shockley-Read generation in the space charge region.
  • Keywords
    Boron; Conducting materials; Conductivity; Delay estimation; Laboratories; Rectifiers; Semiconductor diodes; Silicon; Telephony; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1956 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1956.187015
  • Filename
    1472161