High resolution electro-optic measurements of 2-D field distributions inside MMIC devices

Author

David, Gladbin ; Bussek, P. ; Jager, D.

Author_Institution

Gerhard-Mercator-Univ., Duisburg, Germany

fYear

1996

fDate

2-7 June 1996

Firstpage

450

Lastpage

451

Abstract

Summary form only given. Frequency-domain electro-optic probing of potential and electric field distributions in MMICs have successfully been used for a function and failure test as well as for a quantitative circuit-internal characterization. To demonstrate the capabilities of the measurement technique especially for a device-internal analysis, in this paper the 2D electro-optic field mapping is applied to study coplanar MMIC components with structure sizes in the /spl mu/m and sub-/spl mu/m range. The experimental setup used consists of a combined direct electrooptic measurement system and a confocal laser-scan microscope.

Keywords

MMIC; electric fields; electro-optical effects; integrated circuit testing; measurement by laser beam; optical microscopy; optical resolving power; optical scanners; 2-D field distributions; 2D electro-optic field mapping; MMIC devices; MMICs; confocal laser-scan microscope; coplanar MMIC components; device-internal analysis; direct electrooptic measurement system; electric field distributions; failure test; frequency-domain electro-optic probing; high resolution electro-optic measurements; measurement technique; quantitative circuit-internal characterization; structure sizes; sub-/spl mu/m range; Circuit testing; Detectors; Electrooptic devices; Lasers and electrooptics; MESFETs; MMICs; Microscopy; Optical amplifiers; Optical coupling; Polarization;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on

Conference_Location

Anaheim, CA, USA

Print_ISBN

1-55752-443-2

Type

conf

Filename

864911