• DocumentCode
    3551791
  • Title

    Diffused silicon power transistor characteristics as related to base and emitter geometries

  • Author

    Chaplin, N.J.

  • Author_Institution
    Bell Telephone Laboratories, Inc., Allentown, Pennsylvania
  • Volume
    5
  • fYear
    1959
  • fDate
    1959
  • Firstpage
    78
  • Lastpage
    78
  • Abstract
    The design of diffused silicon high-speed power transistors is complicated by the absence of a suitable design theory. Calculations using alloy transistor theory predict results at variance with measurements made on double diffused silicon units. This is particularly true of effects dependent on emitter width and lateral base current flow. Existing design theory indicates the superiority of narrow emitters whereas experiment reveals that wider emitters often produce a better compromise between speed and efficiency for high current devices.
  • Keywords
    Geometry; Power transistors; Silicon; Switching circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1959 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1959.187139
  • Filename
    1472678