DocumentCode :
3551791
Title :
Diffused silicon power transistor characteristics as related to base and emitter geometries
Author :
Chaplin, N.J.
Author_Institution :
Bell Telephone Laboratories, Inc., Allentown, Pennsylvania
Volume :
5
fYear :
1959
fDate :
1959
Firstpage :
78
Lastpage :
78
Abstract :
The design of diffused silicon high-speed power transistors is complicated by the absence of a suitable design theory. Calculations using alloy transistor theory predict results at variance with measurements made on double diffused silicon units. This is particularly true of effects dependent on emitter width and lateral base current flow. Existing design theory indicates the superiority of narrow emitters whereas experiment reveals that wider emitters often produce a better compromise between speed and efficiency for high current devices.
Keywords :
Geometry; Power transistors; Silicon; Switching circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1959 International
Type :
conf
DOI :
10.1109/IEDM.1959.187139
Filename :
1472678
Link To Document :
بازگشت