DocumentCode
3551791
Title
Diffused silicon power transistor characteristics as related to base and emitter geometries
Author
Chaplin, N.J.
Author_Institution
Bell Telephone Laboratories, Inc., Allentown, Pennsylvania
Volume
5
fYear
1959
fDate
1959
Firstpage
78
Lastpage
78
Abstract
The design of diffused silicon high-speed power transistors is complicated by the absence of a suitable design theory. Calculations using alloy transistor theory predict results at variance with measurements made on double diffused silicon units. This is particularly true of effects dependent on emitter width and lateral base current flow. Existing design theory indicates the superiority of narrow emitters whereas experiment reveals that wider emitters often produce a better compromise between speed and efficiency for high current devices.
Keywords
Geometry; Power transistors; Silicon; Switching circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1959 International
Type
conf
DOI
10.1109/IEDM.1959.187139
Filename
1472678
Link To Document