• DocumentCode
    3551878
  • Title

    InP homojunction solar cells grown by gas-source molecular beam epitaxy

  • Author

    Zibin, J.P. ; Rakennus, K. ; Tappura, K. ; Zhang, G. ; Lammasniemi, J. ; Asonen, H.

  • Author_Institution
    Dept. of Phys., Tampere Univ. of Technol., Finland
  • fYear
    1991
  • fDate
    8-11 Apr 1991
  • Firstpage
    48
  • Lastpage
    51
  • Abstract
    The application of the gas-source molecular beam epitaxy technique to the growth of InP homojunction solar cells is discussed. Cells of various emitter thicknesses as well as with a graded emitter were grown. Attempts to improve on the blue response of the 200 Å non-graded emitter solar cell by growing 100 Å and graded 200 Å emitter cells were unsuccessful; the blue responses for all three cells were nearly identical. The spectral response of the ⩽200 Å emitter cells was found to vary greatly in time before SiNx antireflection coating deposition and was restored after SiNx deposition
  • Keywords
    III-V semiconductors; chemical beam epitaxial growth; indium compounds; semiconductor growth; solar cells; InP homojunction solar cells; SiNx antireflection coating deposition; blue response; gas-source molecular beam epitaxy; graded emitter; spectral response; Coatings; Doping; Gold; Indium gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Photovoltaic cells; Plasma measurements; Silicon compounds; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1991., Third International Conference.
  • Conference_Location
    Cardiff
  • Print_ISBN
    0-87942-626-8
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1991.147290
  • Filename
    147290