• DocumentCode
    3551881
  • Title

    Optimization of base doping for radiation hard InP solar cells

  • Author

    Augustine, G. ; Rohatgi, A. ; Jokerst, N.M.

  • Author_Institution
    Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    1991
  • fDate
    8-11 Apr 1991
  • Firstpage
    60
  • Lastpage
    63
  • Abstract
    Model calculations were performed (1) to determine the optimum base doping for InP solar cells to achieve high efficiency under terrestrial conditions and (2) to quantify the difference, if any, in the optimum base doping for terrestrial and space applications. Modeling was done for a midgap trap and a shallow trap at Ev+0.2 eV to determine the effect of trap location on the optimum base doping before radiation. After irradiation, modeling was done using the H4 trap at Ev+0.37 eV, since the H4 defect controls the lifetime in the radiated InP cells. The highest efficiency for InP solar cells under terrestrial conditions is obtained for a base doping of 2×1017 cm-3 prior to irradiation and is independent of the defect energy level. Optimum base doping needs to be increased beyond 2×1017 cm-3 for irradiated InP cells because presence of more dopants reduces the rate of formation of radiation induced lifetime-limiting defects. The shift in the base doping depends on the amount of irradiation dose and is due to the decrease in radiation induced H4 defect concentration-with increased doping
  • Keywords
    III-V semiconductors; carrier lifetime; electron beam effects; hole traps; indium compounds; ion implantation; minority carriers; radiation hardening (electronics); semiconductor device models; solar cells; H4 trap; III-V semiconductor; InP solar cells; efficiency; electron irradiation effect; ion implantation; midgap trap; minority carrier lifetime; optimum base doping; radiation hard cells; radiation induced lifetime-limiting defects; shallow trap; space applications; terrestrial conditions; Buffer layers; Charge carrier lifetime; Computational modeling; Doping; Gallium arsenide; Indium phosphide; Microelectronics; Photovoltaic cells; Scattering; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1991., Third International Conference.
  • Conference_Location
    Cardiff
  • Print_ISBN
    0-87942-626-8
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1991.147293
  • Filename
    147293