DocumentCode :
3551933
Title :
Hot-glass sealed silicon diodes
Author :
Decker, Vincent ; Forster, J.H. ; Howard, B.T.
Volume :
7
fYear :
1961
fDate :
1961
Firstpage :
64
Lastpage :
66
Abstract :
A hard-glass kovar encapsulation technique for hermetically sealing diffused silicon mesa diodes is described. The seal-in operation is a hot-seal technique, since the glass parts of the package reach temperatures from 800°C to 1000°C during the final sealing operation, and the silicon wafer is exposed to high temperatures during closure of the package. Experiments with this structure indicate that this hot-seal process leads to a relatively clean, dry environment and a stable semiconductor surface. Electrical characteristics of silicon wafers are preserved or improved by hot seal-in, and the encapsulated diodes exhibit a high degree of electrical stability.
Keywords :
Electric variables; Encapsulation; Glass; Hermetic seals; Lead compounds; Semiconductor device packaging; Semiconductor diodes; Silicon; Surface cleaning; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1961 Internationa
Type :
conf
DOI :
10.1109/IEDM.1961.187243
Filename :
1473079
Link To Document :
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