DocumentCode :
3551966
Title :
Relaxation mechanism of Yb 4f-shell in InP
Author :
Taguchi, Akihito ; Nakagome, Hiroshi ; Takahei, Kenichiro
Author_Institution :
NTT Basic Res. Lab., Tokyo, Japan
fYear :
1991
fDate :
8-11 Apr 1991
Firstpage :
134
Lastpage :
137
Abstract :
Comparison of the temperature dependencies of the intra-4f-shell photoluminescence (PL) and free electron concentration in Yb-doped InP reveals that two mechanisms dominate the thermal quenching of this PL. One is the localized Auger effect, which is effective in samples with an excess donor concentration. The other mechanism is independent of n- and p-type impurities and has an activation energy of about 150 meV. Investigation of the relationship between the temperature dependencies of the band-edge related PL and the 4f-shell PL indicates that this is due to the energy back transfer from the Yb 4f-shell to the host electronic state
Keywords :
III-V semiconductors; carrier density; electron traps; impurity electron states; indium compounds; luminescence of inorganic solids; photoluminescence; radiation quenching; ytterbium; III-V semiconductor; InP:Yb; activation energy; energy back transfer; free electron concentration; intra-4f-shell photoluminescence; localized Auger effect; relaxation mechanism; temperature dependencies; thermal quenching; Electron traps; Hall effect; Indium phosphide; Laboratories; Luminescence; Optical devices; Spectroscopy; Temperature dependence; Temperature measurement; Thermal quenching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1991., Third International Conference.
Conference_Location :
Cardiff
Print_ISBN :
0-87942-626-8
Type :
conf
DOI :
10.1109/ICIPRM.1991.147311
Filename :
147311
Link To Document :
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