DocumentCode
355215
Title
Photorefractivity of functionalized silica films prepared by sol-gel method
Author
Chaput, F. ; Boilot, J.-P. ; Riehl, D. ; Canva, M. ; Levy, Y. ; Brun, Anders
Author_Institution
Lab. de Phys. de la Matiere Condensee, Ecole Polytech., Palaiseau, France
fYear
1996
fDate
2-7 June 1996
Firstpage
478
Abstract
Summary form only given. Photorefractivity of sol gel prepared silica films were confirmed from two-beam-coupling measurements, performed with a He-Ne cw laser at 633 nm without applied electric field. A strong absorption was present, however the relative energy transfer was +/- 10% on the weak beam, depending on the sample orientation.
Keywords
measurement by laser beam; multiwave mixing; optical couplers; optical films; optical harmonic generation; photorefractive materials; silicon compounds; sol-gel processing; 633 nm; He-Ne; He-Ne cw laser; SiO/sub 2/; functionalized silica films; photorefractivity; relative energy transfer; sample orientation; sol-gel method; strong absorption; two-beam-coupling measurements; weak beam; Absorption; Diffraction; Four-wave mixing; Laser excitation; Optical films; Photorefractive effect; Photorefractive materials; Polarization; Silicon compounds; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1996. CLEO '96., Summaries of papers presented at the Conference on
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-443-2
Type
conf
Filename
864952
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