Title :
InGaAs/InP submicron gate microwave power transistors for 20 GHz applications
Author :
Johnson, G.A. ; Biedenbender, M.D. ; Kapoor, V.J. ; Messick, L.J. ; Nguyen, R. ; Schmitz, D. ; Jurgensen, H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA
Abstract :
Results of DC characteristic and RF power performance measurements on depletion mode InGaAs MISFETs with submicron gate lengths fabricated using an epitaxial process are presented. At 18 GHz, an output power density of 0.92 W/mm was obtained at an input power of 19.5 dBm. The corresponding gain and power-added efficiency were 3.2 dB and 29% respectively. The highest power-added efficiency obtained was 32% with a corresponding power gain and output power density of 4.3 dB and 0.86 W/mm, respectively, at an input power of 18 dBm. At 20 GHz, an output power density of 0.79 W/mm was obtained with a corresponding gain and power-added efficiency of 3.0 dB and 23%, respectively. The highest power-added efficiency was 25% at 0.73 W/mm output power density and 4.8 dB gain
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; insulated gate field effect transistors; power transistors; solid-state microwave devices; 20 to 18 GHz; 3 to 4.8 dB; 32 to 23 percent; DC characteristic; InGaAs-InP; InP substrates; MISFETs; RF power performance measurements; depletion mode; epitaxial process; gain; input power; microwave power transistors; output power density; power-added efficiency; semiconductors; submicron gate; Fabrication; Frequency; Gold; Indium gallium arsenide; Indium phosphide; Lattices; MISFETs; Plasma temperature; Power generation; Power transistors;
Conference_Titel :
Indium Phosphide and Related Materials, 1991., Third International Conference.
Conference_Location :
Cardiff
Print_ISBN :
0-87942-626-8
DOI :
10.1109/ICIPRM.1991.147403