• DocumentCode
    3552311
  • Title

    The temperature dependence of ideal gain in double diffused silicon transistors

  • Author

    Bergh, A.A.

  • Volume
    11
  • fYear
    1965
  • fDate
    1965
  • Firstpage
    25
  • Lastpage
    25
  • Abstract
    It has been demonstrated that the base current of planar silicon transistors can be separated into a non-ideal and an ideal component. This paper will neglect the non-ideal component. For transistors with transport factors (β) approaching unity, the ideal component is approximately equal to the minority carrier current injected into the emitter. The resulting gain (hereafter called ideal gain) has the form hFE(ideal) - IC/IpEwhere IpEis the hole current injected into the emitter of an npn transistor. Both components obey the well-known exponential law: I = Ioexp (qVEB/kT) A large temperature dependence of ideal gain can be observed on double diffused planar transistors. The ideal gain on the other hand shows no temperature dependence. This indicates that the temperature coefficient of the injected minority carrier currents are different in the emitter and base regions, while those in the base and collector regions are identical.
  • Keywords
    Circuits; Doping; Geometry; Impurities; Pulse generation; Semiconductor diodes; Silicon; Switches; Telephony; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1965 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1965.187539
  • Filename
    1474120