DocumentCode :
3552347
Title :
A resonant gate silicon bandpass transistor
Author :
Nathanson, H.C. ; Newell, W.E. ; Wickstrom, R.A.
Author_Institution :
Westinghouse Research Laboratories, Pittsburgh, Pa.
Volume :
11
fYear :
1965
fDate :
1965
Firstpage :
38
Lastpage :
38
Abstract :
The use of a suspended clamped-free cantilever beam as the gate electrode for an MOS-type silicon transistor results in a minute, very high Q bandpass filter for integrated circuits. The center frequency of this filter is equal to the mechanical resonant frequency of the cantilever beam electrode. In operation, the metal cantilever is electrically polarized. Input signals are applied between the cantilever and an additional insulated input gate located underneath a portion of the cantilever away from the source-drain regions of the transistor. Electrostatic forces, exerted on the cantilever by the input signal, cause a relatively large cantilever motion perpendicular to the silicon surface at mechanical resonance, with subsequent field-effect modulation of the channel conductance and a corresponding A.C. output voltage. Input frequencies off resonance are rejected.
Keywords :
Band pass filters; Electrodes; Electrostatics; Insulation; Polarization; Resonance; Resonant frequency; Silicon; Structural beams; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1965 International
Type :
conf
DOI :
10.1109/IEDM.1965.187573
Filename :
1474154
Link To Document :
بازگشت