DocumentCode
3552504
Title
Monolithic MOS complementary pairs
Author
Yagura, K.K. ; Catlin, G.M. ; Hutchenson, J.D.
Author_Institution
Signetics Corp., Sunnyvale, Calif.
Volume
12
fYear
1966
fDate
1966
Firstpage
64
Lastpage
64
Abstract
This paper describes the fabrication of stable, monolithic, enhancement-mode, N and P-channel MOS transistors (N-MOST\´s and P-MOST\´s). In recent years, stable, discrete N-MOST\´s and P-MOST\´s have been produced and marketed, but it has generally been found that the fabrication of the two devices on the same substrate led to incompatible processing steps. The major problems in pIocess compatibility have now been solved and stable complementary MOS pairs are being produced which show excellent potential for use in high speed, low power integrated logic circuits. Extensive evaluation of these monolithic complementary pairs has been performed. Device characteristics and reliability data are presented and a process monitoring method is described. Utilization of complementary pairs in integrated logic circuits is discussed and a comparison is made of circuits containing complementary, integrated MOST\´s as contrasted with those containing "single-polarity" MOST\´s. By proper processing techniques, it is possible to obtain a high component density without sacrificing the speed and power advantages of the pairs.
Keywords
Conductivity; Epitaxial layers; Fabrication; Insulation; Integrated circuit reliability; Life testing; Logic circuits; MOSFETs; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1966 International
Type
conf
DOI
10.1109/IEDM.1966.187690
Filename
1474529
Link To Document