• DocumentCode
    3552536
  • Title

    Micropower devices for integrated circuits

  • Author

    Lin, H.C. ; Bohannon, R.

  • Author_Institution
    Texas Instruments Inc., Dallas, Texas
  • Volume
    12
  • fYear
    1966
  • fDate
    1966
  • Firstpage
    92
  • Lastpage
    94
  • Abstract
    This paper describes the development of devices necessary for the design of micropower integrated circuits. These devices were used specifically for complementary micropower (250 micro-watts) NAND and NOR gates and a flip-flop (300 microwatts). NPN and PNP transistors, multiemitter gating transistors, high sheet resistors and high Q capacitors are discussed. Complementary PNP and NPN structures are described as output devices and a multi-emitter device is described for input purposes. By utilizing a separate resistor diffusion, a high temperature coefficient resulted and was used to advantage for compensation of changes in VBEand hFEwith temperature. The high resistivity (500 Ω/□) of the resistor diffusion enabled the actual bar size to be held to a minimum. High Q capacitors were developed using diffused junction techniques that allowed the resistance of the charging path to be decreased. Two methods were incorporated in minimizing inverse alpha of the multi-emitter gating transistor to decrease power drain.
  • Keywords
    Boron; Capacitors; Electrons; Gain control; Instruments; Lithography; MOSFETs; Monolithic integrated circuits; Resistors; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1966 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1966.187720
  • Filename
    1474559