DocumentCode
3552536
Title
Micropower devices for integrated circuits
Author
Lin, H.C. ; Bohannon, R.
Author_Institution
Texas Instruments Inc., Dallas, Texas
Volume
12
fYear
1966
fDate
1966
Firstpage
92
Lastpage
94
Abstract
This paper describes the development of devices necessary for the design of micropower integrated circuits. These devices were used specifically for complementary micropower (250 micro-watts) NAND and NOR gates and a flip-flop (300 microwatts). NPN and PNP transistors, multiemitter gating transistors, high sheet resistors and high Q capacitors are discussed. Complementary PNP and NPN structures are described as output devices and a multi-emitter device is described for input purposes. By utilizing a separate resistor diffusion, a high temperature coefficient resulted and was used to advantage for compensation of changes in VBE and hFE with temperature. The high resistivity (500 Ω/□) of the resistor diffusion enabled the actual bar size to be held to a minimum. High Q capacitors were developed using diffused junction techniques that allowed the resistance of the charging path to be decreased. Two methods were incorporated in minimizing inverse alpha of the multi-emitter gating transistor to decrease power drain.
Keywords
Boron; Capacitors; Electrons; Gain control; Instruments; Lithography; MOSFETs; Monolithic integrated circuits; Resistors; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1966 International
Type
conf
DOI
10.1109/IEDM.1966.187720
Filename
1474559
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