DocumentCode :
3552536
Title :
Micropower devices for integrated circuits
Author :
Lin, H.C. ; Bohannon, R.
Author_Institution :
Texas Instruments Inc., Dallas, Texas
Volume :
12
fYear :
1966
fDate :
1966
Firstpage :
92
Lastpage :
94
Abstract :
This paper describes the development of devices necessary for the design of micropower integrated circuits. These devices were used specifically for complementary micropower (250 micro-watts) NAND and NOR gates and a flip-flop (300 microwatts). NPN and PNP transistors, multiemitter gating transistors, high sheet resistors and high Q capacitors are discussed. Complementary PNP and NPN structures are described as output devices and a multi-emitter device is described for input purposes. By utilizing a separate resistor diffusion, a high temperature coefficient resulted and was used to advantage for compensation of changes in VBEand hFEwith temperature. The high resistivity (500 Ω/□) of the resistor diffusion enabled the actual bar size to be held to a minimum. High Q capacitors were developed using diffused junction techniques that allowed the resistance of the charging path to be decreased. Two methods were incorporated in minimizing inverse alpha of the multi-emitter gating transistor to decrease power drain.
Keywords :
Boron; Capacitors; Electrons; Gain control; Instruments; Lithography; MOSFETs; Monolithic integrated circuits; Resistors; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1966 International
Type :
conf
DOI :
10.1109/IEDM.1966.187720
Filename :
1474559
Link To Document :
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