Title :
The electron beam fabrication of small geometry transistors
Abstract :
The present trend in Molecular Electronics is both to reduce the overall size of the completed circuit and also to go to more complex circuits containing larger numbers of components. Both of these tendencies result in the requirement of smaller component sizes in the circuit. However the planar method normally used to fabricate these components is subject to certain dimensional limitations.
Keywords :
Bipolar transistors; Circuits; Electron beams; Electron optics; Etching; Geometry; Molecular electronics; Optical device fabrication; Resists; Silicon;
Conference_Titel :
Electron Devices Meeting, 1966 International
DOI :
10.1109/IEDM.1966.187730
