DocumentCode :
3552647
Title :
Characteristics and thoery of a silicon carbide P+-I-N photodiode
Author :
Chang, Hung Chi ; Campbell, R.B.
Author_Institution :
Westinghouse Research Laboratories, Pittsburgh, Pa.
Volume :
13
fYear :
1967
fDate :
1967
Firstpage :
56
Lastpage :
56
Abstract :
Silicon carbide diffused junction photodiodes have been fabricated for operation in either the photovoltaic or reverse bias mode. These diodes were fabricated in a manner similar to that described previously, but through the use of advanced techniques improved properties were obtained. Forward impedances as low as 8 × 104ohms and 4 × 104ohms were obtained at 30°C. and 500°C., respectively. Rise times of 10 to 100 microseconds were measured at 30°C. with a slight decrease at 500°C. Peak response wavelengths as short as 2700 A were obtained. When operated in the reverse bias mode, the reverse current of these diodes increases by 5 to 6 orders of magnitude under ultraviolet illumination.
Keywords :
Capacitance; Conductivity; Diodes; Electric breakdown; Laboratories; P-n junctions; Photodiodes; Silicon carbide; Telephony;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1967 International
Type :
conf
DOI :
10.1109/IEDM.1967.187816
Filename :
1474897
Link To Document :
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