DocumentCode :
3552695
Title :
Current gain (hFE) and cutoff frequency (fT) falloff at high current densities
Author :
Whittier, R.J. ; Tremere, D.A.
Volume :
13
fYear :
1967
fDate :
1967
Firstpage :
100
Lastpage :
102
Abstract :
A theoretical and experimental study of bipolar transistor performance at high current densities has been performed. The analytical treatment is based upon the existence of a high level injection condition in the collector. Two models which describe the high current behavior of the collector junction space-charge region are discussed. The first deals with the formation of a current-induced base region at high current densities; the width of this current-induced base depends on the current density. The second model assumes that two-dimensional effects are predominant; at sufficiently high current densities lateral injection of carriers takes place. Theoretical curves for the current density necessary to bring about the space-charge limitation have been computed.
Keywords :
Bipolar transistors; Current density; Cutoff frequency; Electron devices; Etching; Germanium; Iron; Performance gain; Radiative recombination; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1967 International
Type :
conf
DOI :
10.1109/IEDM.1967.187859
Filename :
1474940
Link To Document :
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