DocumentCode
3552699
Title
Interface trapping in unipolar space-charge-limited current
Author
Nicolet, M.A.
Volume
13
fYear
1967
fDate
1967
Firstpage
104
Lastpage
104
Abstract
It is assumed almost invariably in the literature that traps, when present, are distributed uniformly in the bulk of a device. But in unipolar space-charge-limited current (sclc) charge carrier traps suppress current most efficiently when located in the immediate vicinity of the emitter. A new model is developed, therefore, which accounts for this result by assuming that the traps responsible for the current suppression are located at the emitter interface in a surface concentration Σ while the bulk remains free of traps. The analysis has been carried out for traps with one discrete trapping level Et below the edge Eb of the conducting band and for the five distinct cases of planar, cylindrical, and spherical configuration. The main results are: (a) The V-I characteristic exhibits the VTFL typical to many experimental results. (b) The relevant parameter is the ratio
, where r is a length characteristic of the geometrical configuration of the device and N is the effective density of states of the conducting band. (c) For a semispherical emitter ("point contact") unipolar sclc dominated by interface trapping is essentially independent on sample dimensions.
, where r is a length characteristic of the geometrical configuration of the device and N is the effective density of states of the conducting band. (c) For a semispherical emitter ("point contact") unipolar sclc dominated by interface trapping is essentially independent on sample dimensions.Keywords
Annealing; Electron traps; Frequency; Interface states; Publishing; Regions; Semiconductor device noise; Silicon; Snow; Solid state circuits;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1967 International
Type
conf
DOI
10.1109/IEDM.1967.187863
Filename
1474944
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