• DocumentCode
    3552699
  • Title

    Interface trapping in unipolar space-charge-limited current

  • Author

    Nicolet, M.A.

  • Volume
    13
  • fYear
    1967
  • fDate
    1967
  • Firstpage
    104
  • Lastpage
    104
  • Abstract
    It is assumed almost invariably in the literature that traps, when present, are distributed uniformly in the bulk of a device. But in unipolar space-charge-limited current (sclc) charge carrier traps suppress current most efficiently when located in the immediate vicinity of the emitter. A new model is developed, therefore, which accounts for this result by assuming that the traps responsible for the current suppression are located at the emitter interface in a surface concentration Σ while the bulk remains free of traps. The analysis has been carried out for traps with one discrete trapping level Etbelow the edge Ebof the conducting band and for the five distinct cases of planar, cylindrical, and spherical configuration. The main results are: (a) The V-I characteristic exhibits the VTFLtypical to many experimental results. (b) The relevant parameter is the ratio rN/ \\Sigma \\exp ((E_{b} - E_{t})/kT) , where r is a length characteristic of the geometrical configuration of the device and N is the effective density of states of the conducting band. (c) For a semispherical emitter ("point contact") unipolar sclc dominated by interface trapping is essentially independent on sample dimensions.
  • Keywords
    Annealing; Electron traps; Frequency; Interface states; Publishing; Regions; Semiconductor device noise; Silicon; Snow; Solid state circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1967 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1967.187863
  • Filename
    1474944