Submicron, electron beam addressed storage structures and associated electron optics

A high density, high contrast storage system of about 10⁸bits capacity and submicro-second speed is described. The storage elements are an array of electrically isolated, submicron diameter capacitors, each at the bottom of a hole in a molybdenum-alumina-molybdenum film sandwich on a sapphire substrate. Such mosaics are produced by appropriate sequences of film depositions, electron beam resist formations, and selective etching of unprotected areas.