DocumentCode :
3552734
Title :
Silicon-on-sapphire bipolar transistors
Author :
Heiman, F.P. ; Robinson, P.H.
Author_Institution :
RCA Laboratories, Princeton, N. J.
Volume :
13
fYear :
1967
fDate :
1967
Firstpage :
136
Lastpage :
136
Abstract :
All-epitaxial bipolar transistors have been fabricated in silicon-on-sapphire films which exhibit a common-emitter low frequency current gain hfeof 10 at room temperature. The value of hfeincreases approximately as the square of the absolute temperature, which suggests recombination by charged coulomb centers in the base region. Monotonic increase in hfewith collector current up to 100 mA (emitter area is 0.8 × 1.2 sq. mils) is probably due to trap-filling in the base region. No conductivity modulation, which would result in beta fall-off, is seen up to 500 mA of collector current. This is a narrow ( 0.6\\\\mu M), heavily doped ( \\sim 10^{7}; cm-3) base region.
Keywords :
Bipolar transistors; Doping; Fabrication; Frequency; Germanium; Laboratories; Semiconductor films; Silicon; Temperature; Wideband;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1967 International
Type :
conf
DOI :
10.1109/IEDM.1967.187896
Filename :
1474977
Link To Document :
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