• DocumentCode
    3552889
  • Title

    Simple physical model for the injection efficiency of diffused pn-junctions

  • Author

    Whittier, R.J. ; Downing, J.P.

  • Author_Institution
    Fairchild Semiconductor Research and Development, Palo Alto, Calif.
  • Volume
    14
  • fYear
    1968
  • fDate
    1968
  • Firstpage
    72
  • Lastpage
    72
  • Abstract
    The mechanism responsible for the injection efficiency of highly doped asymmetrical pn-junctions remains as one of the unanswered questions of pn-junction theory. To account for the experimentally measured injection ratio an extremely low lifetime must be assumed in the more highly doped region. This lifetime may be four to five orders of magnitude lower than that existing in the adjacent junction space-charge layer. The arbitrary assignment of a low lifetime to the heavily doped region has not been previously justified.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1968 International
  • Type

    conf

  • DOI
    10.1109/IEDM.1968.188002
  • Filename
    1475527