DocumentCode :
3552889
Title :
Simple physical model for the injection efficiency of diffused pn-junctions
Author :
Whittier, R.J. ; Downing, J.P.
Author_Institution :
Fairchild Semiconductor Research and Development, Palo Alto, Calif.
Volume :
14
fYear :
1968
fDate :
1968
Firstpage :
72
Lastpage :
72
Abstract :
The mechanism responsible for the injection efficiency of highly doped asymmetrical pn-junctions remains as one of the unanswered questions of pn-junction theory. To account for the experimentally measured injection ratio an extremely low lifetime must be assumed in the more highly doped region. This lifetime may be four to five orders of magnitude lower than that existing in the adjacent junction space-charge layer. The arbitrary assignment of a low lifetime to the heavily doped region has not been previously justified.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1968 International
Type :
conf
DOI :
10.1109/IEDM.1968.188002
Filename :
1475527
Link To Document :
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