DocumentCode
3552889
Title
Simple physical model for the injection efficiency of diffused pn-junctions
Author
Whittier, R.J. ; Downing, J.P.
Author_Institution
Fairchild Semiconductor Research and Development, Palo Alto, Calif.
Volume
14
fYear
1968
fDate
1968
Firstpage
72
Lastpage
72
Abstract
The mechanism responsible for the injection efficiency of highly doped asymmetrical pn-junctions remains as one of the unanswered questions of pn-junction theory. To account for the experimentally measured injection ratio an extremely low lifetime must be assumed in the more highly doped region. This lifetime may be four to five orders of magnitude lower than that existing in the adjacent junction space-charge layer. The arbitrary assignment of a low lifetime to the heavily doped region has not been previously justified.
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 1968 International
Type
conf
DOI
10.1109/IEDM.1968.188002
Filename
1475527
Link To Document